In the electronic, optical and precision polishing process, the polishing mechanism than grinding complex. Polishing are not relying on a simple mechanical action, but a together with a special chemical reaction, so that the workpiece surface finish is getting perfect. Can be achieved the polishing effect of the design must not ignore the importance of the polishing pad. In addition to hardness, density, thickness and other specifications, the pad surface material of the pad surface microporous pore size, arrangement, etc. Can the same polishing slurry composition, particle size and workpiece materials with are taken into account. 
 SSURFIN XXX-5 
 SSURFIN XXX-5 is a non-woven, rigid fiber of the polishing cloth. Mainly used for the thinning of GaAs and other semiconductors. Rough polishing process. When use in medium or high pressure, this polishing cloth ideal compression combination with an appropriate proportion of the permeability of the polishing cloth padding to reduce, while maintaining a flat noodle processing and high-quality precision machining effect. More importantly, this product is durable, thus reducing costs. 
 SURFIN 018-3 
 The SURFIN 018-3 is a instant noodles structure leathery abrasive cloth. Special treatment, this product has a fast start, and good acid resistance, alkali resistance, remained stable, sustained, effective polishing process in order to get uniform polished surface. This product is suitable for polishing various metal disk, such as aluminum, nickel. It can be used to provide a non-injury, no orange peeling, flawless high-quality polished surface. 
 SURFIN 000 
 SURFIN 000 is designed for fine polishing and polishing cloth. Very close to a smile the pores of the layer due to its polyurethane outer layer of very soft, so the polishing cloth for high Love without mist, and the polished surface of the spike. 
 The SURFIN SSW-1 
 The SURFIN SSW-1 is a suede quality polishing cloth. Compared to SURFIN 000, this product uses a different polyurethane materials, longer pore length, thus shortening the time to start finishing. This product is particularly suitable for polishing silicon, GaAs, indium phosphide. 
 SURFIN 191 
 SURFIN 191 is designed specifically for precision polishing of gallium arsenide films and silicon polishing cloth. Polished crystal surface quality, no mist. SURFIN 191 leather foam outer layer and the basis can not use adhesive bonding, compared to traditional products, there is a huge improvement in quality and durability. Changes in thickness and material of the base fabric, the product is suitable for a wide range of polishing conditions. 
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